Structural And Optical Characterization Of DC Reactive Magnetron Sputtered Cu₃N Films

K. Venkata Subba Reddy, P. Sreedhara Reddy and S. Uthanna

Department of Physics, Sri Venkateswara University, Tirupati - 517 502 (India)

ABSTRACT:

Dc reactive magnetron sputtering technique was employed for deposition of copper nitride films on glass substrates under different sputtering pressures in the range 1x10-2 – 1x10-1 mbar. The influence of sputtering pressure on the structural and optical properties was systematically investigated.

KEYWORDS: DC reactive magnetron sputtered Cu3N films

Copy the following to cite this article: Reddy K. V. S, Reddy P. S, Uthanna S. Structural And Optical Characterization Of DC Reactive Magnetron Sputtered Cu3N Films. Mat.Sci.Res.India;5(1)

Copy the following to cite this URL: Reddy K. V. S, Reddy P. S, Uthanna S. Structural And Optical Characterization Of DC Reactive Magnetron Sputtered Cu3N Films. Mat.Sci.Res.India;5(1). Available from: http://www.materialsciencejournal.org/?p=1978

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