P. Mitra
Department of Physics, The University of Burdwan, Golapbag, Burdwan - 713 104 (India).
Article Received on : 8 Aug 2009
Article Accepted on : 15 Oct 2009
Article Published :
Plagiarism Check: Yes
The electrical characteristic of palladium incorporated zinc oxide thin film was carried out by monitoring the variation of electrical resistance with temperature (T) in the temperature range 300-480K. It was observed that Pd doping increases the resistance and also increases the low temperature activation barrier value to ~0.43 eV compared to ~0.3 eV for undoped ZnO films.
KEYWORDS: ZnO; Pd doping; activation barrierCopy the following to cite this article: Mitra P. Effect of Palladium Incorportaion on Electrical Properties of Zno. Mat.Sci.Res.India;6(2) |
Copy the following to cite this URL: Mitra P. Effect of Palladium Incorportaion on Electrical Properties of Zno. Mat.Sci.Res.India;6(2). Available from: http://www.materialsciencejournal.org/?p=3578 |